Now showing items 1-2 of 2

    • Quarter-micron lithography with a gapped Markle-Dyson system 

      Owen, G.; Borkholder, David; Knorr, C.; Markle, David; Pease, R. (American Vacuum Society, 1994-11)
      0.25-µm lithography has previously been demonstrated using an ungapped prototype Markle–Dyson system, in which the wafer was held in soft contact with the mask. However, such an in-contact scheme would be inappropriate for ...
    • Solid-state array cameras 

      Strull, G.; List, W.; Irwin, E.; Farnsworth, David (Optical Society of America, 1972-05)
      Over the past few years there has been growing interest shown in the rapidly maturing technology of totally solid-state imaging. This paper presents a synopsis of developments made in this field at the Westinghouse ATL ...