Search
Now showing items 1-10 of 11
Atmospheric microplasma in a wide-slit configuration for nanofabrication
(Dry Process Symposium, 2008-11)
Silicon nanocrystals and self-organized carbon nanoarchitectures fabricated by atmospheric microplasma
(Dry Process Symposium, 2008-11)
The Production of self-organized carbon connections between Ag nanoparticles using atmospheric microplasma synthesis
(Elsevier, 2008-10-10)
The formation of long self-organized carbon connections (where the length is much greater
than the diameter) between Ag nanoparticles on a Si(100) surface in atmospheric pressure
Ar + CH4 microplasmas is demonstrated. A ...
RIT Undergraduate Symposium 2008
(Rochester Institute of Technology, 2008-08)
The Undergraduate Research Symposium was founded to honor student achievement in scientific research and to further RIT's goal of combining traditional laboratory work and classroom instruction with experiential learning. ...
Development of a linear source, atmospheric-pressure, non-thermal RF glow discharge plasma for surface treatment, etchin, and thin film deposition
(Rochester Institute of Technology chapter of the Institute of Electrical and Electronics Engineers (IEEE), 2008-05-03)
Investigation of microplasma cells fabricated on silicon wafer
(Rochester Institute of Technology, 2008-05)
Development of a linear source, atmospheric-pressure, non-thermal RF glow discharge plasma
(Rochester Institute of Technology, 2008-05)
Assembly of aligned linear patterns via block copolymer lithography
(Rochester Institute of Technology, 2008-05)
Education and research initiatives in microelectronic engineering towards energy applications
(2008 Harrison Howe Award Event, 2008-03-18)
Luminescent colloidal silicon nanocrystals prepared by nanoseconds laser fragmentation and laser ablation in water
(Materials Reseach Society (MRS), 2008-03)
The surface states of silicon nanocrystals (Si-ncs) considerably affect quantum confinement effects and may determinate final nanocrystals properties. Colloidally dispersed Si-ncs offer larger freedom for surface modification ...