Browsing Citations Only by Subject "Mask reflector"
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Quarter-micron lithography with a gapped Markle-Dyson system
(American Vacuum Society, 1994-11)0.25-µm lithography has previously been demonstrated using an ungapped prototype Markle–Dyson system, in which the wafer was held in soft contact with the mask. However, such an in-contact scheme would be inappropriate for ...