Browsing Citations Only by Subject "Photo-oxidation"

Now showing items 1-5 of 5

    • Adhesion of copper to poly(tetrafluoroethylene-co-hexafluoropropylene) (FEP) surfaces modified by vacuum UV photo-oxidation downstream from Ar microwave plasma 

      Dasilva, W.; Entenberg, Alan; Kahn, B.; Debies, Thomas; Takacs, Gerald (Springer-Verlag: Journal of Adhesion Science and Technology, 2004-12)
      Poly(tetrafluoroethylene-co-hexafluoropropylene) (FEP) surfaces were exposed to vacuum UV (VUV) photo-oxidation downstream from Ar microwave plasma. The modified surfaces showed the following: (1) an improvement in wettability ...

    • Adhesion of copper to teflon surfaces modified by vacuum UV photo-oxidation downstream from Ar microwave plasma 

      Dasilva, W.; Entenberg, Alan; Kahn, B.; Debies, Thomas; Takacs, Gerald (The American Chemical Society: Polymeric Materials Science and Engineering, 2004)
      Fluoropolymers, like Teflon(r) PTFE (polytetrafluoroethylene) and FEP (fluorinated ethylene-propylene co-polymer), have been extensively used in space applications, protective coatings, microelectronics packaging and ...

    • Photo-oxidation of multiwalled carbon nanotubes 

      Parekh, Bhavin; Debies, Thomas; Knight, Pam; Santhanam, K.S.V.; Takacs, Gerald (Materials Research Society Proceedings: Degradation Processes in Nanostructured Materials, 2006)
      MWNTs were photo-oxidized in quartz boats using low-pressure Hg lamps and emission downstream from Ar microwave plasmas which are primarily atomic line sources of 253.7 and 184.9 nm UV, and 106.7 and 104.8 nm vacuum UV ...

    • Photo-oxidation of singlewalled carbon nanotubes 

      Parekh, Bhavin; Debies, Thomas; Evans, C.; Landi, Brian; Raffaelle, Ryne; Takacs, Gerald (Materials Research Society Proceedings: Degradation Processes in Nanostructured Materials, 2006)
      UV- and vacuum UV-assisted photo-oxidation of single-walled carbon nanotube (SWNT) paper occurred with: (1) atmospheric oxygen pressure using low-pressure Hg lamps (ë = 253.7 and 184.9 nm), (2) low oxygen pressure employing ...

    • Surface modification of poly(biphenyl dianhydride-para-phenylene diamine) (BPDA-PDA) polyimide by UV photo-oxidation 

      Sener, U.; Parekh, Bhavin; Entenberg, Alan; Debies, Thomas; Takacs, Gerald (Springer-Verlag: Journal of Adhesion Science and Technology, 2006-03)
      Poly(biphenyl dianhydride-para-phenylene diamine) (BPDA-PDA, Upilex-S) polyimide (PI), was exposed to 185 and 254 nm UV radiation in the presence of oxygen at atmospheric pressure. SEM micrographs revealed only a small ...