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dc.contributor.authorHe, Lilingen_US
dc.contributor.authorWagner, Shawnen_US
dc.contributor.authorIllingsworth, Marvinen_US
dc.contributor.authorJensen, Andrewen_US
dc.contributor.authorYap, Glennen_US
dc.contributor.authorRheingold, Arnolden_US
dc.date.accessioned2006-07-19T19:39:02Zen_US
dc.date.available2006-07-19T19:39:02Zen_US
dc.date.issued1997-12en_US
dc.identifier.citationChemistry of Materials 9N12 (1997) 3005-3011en_US
dc.identifier.issn1520-5002en_US
dc.identifier.urihttp://hdl.handle.net/1850/2166en_US
dc.descriptionRIT community members may access full-text via RIT Libraries licensed databases: http://library.rit.edu/databases/
dc.description.abstractTo increase the concentration of inorganic component in polyimide films and enhance the materials' resistance to atomic oxygen, the complex (4-amino-N,N'-disalicylidene-1,2-phenylenediaminato)(N,N'-disalicylidene-1,2-phenylenediaminato)zirconium(IV), Zr(adsp)(dsp), was synthesized and allowed to react with poly(maleic anhydride) (PMA). The resulting Zr-PMA pendent polymer was mixed with a commercially available polyamic acid of pyromellitic dianhydride and 4,4'-oxydianiline (PMDA-ODA) in various proportions in NMP. Films were then cast onto glass substrates, and thermally imidized. The new mixed ligand complex and the Zr-PMA polymer were characterized by TLC, IR, 1H NMR, and elemental analysis, along with X-ray crystallography for the former and TGA for the latter. The imidized films of the Zr-PMA polymer blended with PMDA-ODA polyimide were studied by optical examination of multilayer film samples for crack formation, and SEM photography before and after atomic oxygen erosion in a plasma asher. The upper limit of Zr complex incorporation onto prebaked poly(maleic anhydride) was approximately 24% (mol of Zr/mol of repeat units). The upper limit of zirconium complex concentration for the Zr-PMA/PMDA-ODA blends, above which films crack upon imidization, was 8 mol %, compared to 4 mol % for mixtures of Zr(dsp)2 in PMDA-ODA polyimide.en_US
dc.description.sponsorshipThe authors wish to gratefully acknowledge the NASA Joint Venture program and RIT for financial support of this research.en_US
dc.format.extent31371 bytesen_US
dc.format.mimetypeapplication/pdfen_US
dc.language.isoen_USen_US
dc.publisherThe American Chemical Society: Chemistry of Materialsen_US
dc.subjectAtomic oxygenen_US
dc.subjectPolyimide filmsen_US
dc.subjectResistanceen_US
dc.titleHomogeneous polyimide films with increased bis(N,N'-disalicylidene-1,2-phenylenediaminato)zirconium(IV) contenten_US
dc.typeAbstracten_US
dc.identifier.urlhttp://dx.doi.org/10.1021/cm970356i


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