dc.contributor.author | Chen, J. | en_US |
dc.contributor.author | Tracy, D. | en_US |
dc.contributor.author | Zheng, S. | en_US |
dc.contributor.author | Xiaolu, L. | en_US |
dc.contributor.author | Brown, Scott | en_US |
dc.contributor.author | VanDerveer, William | en_US |
dc.contributor.author | Entenberg, Alan | en_US |
dc.contributor.author | Vukanovic, V. | en_US |
dc.contributor.author | Takacs, Gerald | en_US |
dc.contributor.author | Egitto, F. | en_US |
dc.contributor.author | Matienzo, L. | en_US |
dc.contributor.author | Emmi, F. | en_US |
dc.date.accessioned | 2006-07-19T19:59:03Z | en_US |
dc.date.available | 2006-07-19T19:59:03Z | en_US |
dc.date.issued | 2003-03 | en_US |
dc.identifier.citation | Polymer Degradation and Stability 79N3 (2003) 399-404 | en_US |
dc.identifier.issn | 0141-3910 | en_US |
dc.identifier.uri | http://hdl.handle.net/1850/2229 | en_US |
dc.description | G.A.T. is grateful for an RIT Faculty Development Grant that allowed presentation of this paper at the XIXth IUPAC Symposium on Photochemistry, Budapest, Hungary, 14–19 July 2002. | en_US |
dc.description | RIT community members may access full-text via RIT Libraries licensed databases: http://library.rit.edu/databases/ | |
dc.description.abstract | Films of poly(tetrafluoroethylene-co-hexafluoropropylene) (FEP) were exposed to radiation from 6.7 x 104 Pa He and Ar dc arc plasmas that were made to rotate inside of a graphite tube by the application of an auxiliary magnetic field. The films were covered with optical filters having different cut-off wavelengths to vary the vacuum ultraviolet (VUV) radiation that modified the fluoropolymer surface. With arc currents of 7 A and sample temperatures up to 110 oC, the photoetch rate of FEP was ca. 50% higher than for PTFE. Consistent with results for PTFE, treated FEP showed the following: (1) contact angles that started to decrease in the wavelength region between 173 and 160 nm and continued to decrease with shorter wavelengths; (2) surface roughening; (3) defluorination of the surface with a slight increase in the atomic%C and formation of C-C bonds in the top 3-5 nm of the surface as detected by XPS analysis; and (4) incorporation of oxygen, presumably from reaction with oxygen in air. | en_US |
dc.format.extent | 37365 bytes | en_US |
dc.format.mimetype | application/pdf | en_US |
dc.language.iso | en_US | en_US |
dc.publisher | Elsevier: Polymer Degradation and Stability | en_US |
dc.title | Photoetching and modification of poly(tetrafluoroethylene-co-hexafluoropropylene) polymer surfaces with vacuum UV radiation | en_US |
dc.type | Abstract | en_US |
dc.subject.keyword | FEP | en_US |
dc.subject.keyword | Photoetch rate | en_US |
dc.subject.keyword | PTFE | en_US |
dc.subject.keyword | Vacuum ultraviolet | en_US |
dc.identifier.url | http://dx.doi.org/10.1016/S0141-3910(02)00339-7 | |