• Login
    View Item 
    •   RIT Digital Archive Home
    • Meeting minutes, announcements and publications from RIT Colleges
    • Citations Only
    • View Item
    •   RIT Digital Archive Home
    • Meeting minutes, announcements and publications from RIT Colleges
    • Citations Only
    • View Item
    JavaScript is disabled for your browser. Some features of this site may not work without it.

    Properties of segmented polyether poly(urethaneureas) based of 2,4-toluene diisocyanate. 2. Infrared and mechanical Studies

    Thumbnail
    Date
    1980-01
    Author
    Paik Sung, C.
    Smith, Thomas
    Sung, N.
    Metadata
    Show full item record
    Abstract
    : IR spectra of two series of polyether poly(urethaneureas) based on 2,4-toluene diisocyanate, ethylenediamine, and either 1000 or 2000 molecular weight poly(tetramethy1ene oxide) were examined first to elucidate the state of the hydrogen bonding in the hard segment domain and at the interface between the domains and the soft segment phase. In both series, IR analysis suggests the presence of three-dimensional hydrogen bonding within their hard segment domains, where one urea carbonyl oxygen is bonded to two NH groups. The interface between domain and the soft segment matrix is quite sharp since most of the urethane carbonyl is free from bonding. Mechanical properties, specifically stress-strain behavior, hysteresis, and stress relaxation, are reported in this study to demonstrate the consequences of improved phase segregation and domain structure and to differentiate the morphologies of the two series. At the same urea content (30%), the domain in the PTMO 1000 sample is more interconnected than that in the PTMO 2000 sample, and, also, the soft segment phase of the former contains more solubilized hard segment than that of the latter. The PTMO 2000 sample, which has a better phase segregation than the PTMO 1000 sample, exhibits better mechanical properties, such as higher elongation at break, greater toughness, lower hysteresis, and a slower rate of stress relaxation, even though ultimate tensile strength is slightly lower.
    URI
    http://hdl.handle.net/1850/2334
    Collections
    • Citations Only

    About RIT Digital Archive
    RIT Libraries | Rochester Institute of Technology | 90 Lomb Memorial Drive, Rochester, New York 14623
    Theme by 
    Atmire NV
     

     

    Browse

    All of RIT Digital ArchiveCommunities & CollectionsBy Issue DateAuthorsTitlesSubjectsThis CollectionBy Issue DateAuthorsTitlesSubjects

    My Account

    LoginRegister

    About RIT Digital Archive
    RIT Libraries | Rochester Institute of Technology | 90 Lomb Memorial Drive, Rochester, New York 14623
    Theme by 
    Atmire NV