dc.contributor.author | Fan, Yongfa | en_US |
dc.contributor.author | Lafferty, Neal | en_US |
dc.contributor.author | Bourov, Anatoly | en_US |
dc.contributor.author | Zavyalova, Lena | en_US |
dc.contributor.author | Smith, Bruce | en_US |
dc.date.accessioned | 2007-07-05T14:09:19Z | en_US |
dc.date.available | 2007-07-05T14:09:19Z | en_US |
dc.date.issued | 2005-07-01 | en_US |
dc.identifier.citation | Applied Optics 44N19 (2005) 3904-3911 | en_US |
dc.identifier.issn | 0003-6935 | en_US |
dc.identifier.uri | http://hdl.handle.net/1850/4235 | en_US |
dc.description | RIT community members may access full-text via RIT Libraries licensed databases: http://library.rit.edu/databases/ | |
dc.description.abstract | As an emerging technique, water immersion lithography, offers the capability of reducing critical dimensions
by increasing the numerical aperture that is due to the higher refractive indices of immersion
liquids than that of air. However, in the process of forming a water fluid layer between the resist and the
lens surfaces, air bubbles are often created because of the high surface tension of water. The presence of
air bubbles in the immersion layer will degrade the image quality because of the inhomogeneity-induced
light scattering in the optical path. Analysis by geometrical optics indicates that the total reflection of
light causes the enhancement of scattering in the region in which the scattering angle is less than the
critical scattering angle, which is 92 deg at 193 nm. Based on Mie theory, numerical evaluation of
scattering that is due to air bubbles, polystyrene spheres, and poly(methyl methacrylate) spheres was
conducted for TE, TM, or unpolarized incident light. Comparison of the scattering patterns shows that the
polystyrene spheres and air bubbles resemble each other with respect to scattering properties. In this
paper, polystyrene spheres are used to mimic air bubbles in studies of lithographic imaging of bubbles in
immersion water. In an interferometric lithography system, the distance beyond which bubbles will not
print can be estimated by direct counting of defect sites. | en_US |
dc.language.iso | en_US | en_US |
dc.publisher | Optical Society of America | en_US |
dc.relation.ispartofseries | vol. 44 | en_US |
dc.relation.ispartofseries | no. 19 | en_US |
dc.subject | Immersion | en_US |
dc.subject | MIE scattering | en_US |
dc.subject | Optical lithography | en_US |
dc.title | Air bubble-induced light-scattering effect on image quality in 193 nm immersion lithography | en_US |
dc.type | Article | en_US |
dc.identifier.url | http://dx.doi.org/10.1364/AO.44.003904 | |