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dc.contributor.authorDestler, William
dc.contributor.authorDeGrange, J.
dc.contributor.authorFleischmann, H.
dc.contributor.authorRodgers, J.
dc.contributor.authorSegalov, Z.
dc.date.accessioned2009-05-21T16:07:32Z
dc.date.available2009-05-21T16:07:32Z
dc.date.issued1991-05-01
dc.identifier.citationW.W. Destler, J.E. DeGrange, H.H. Fleischmann, J. Rodgers, and Z. Segalov, "Experimental Studies of High Power Microwave Reflection, Transmission, and Absorption from a Plasma-Covered Plane Conducting Boundary," J. Appl. Phys., 69 , 6313(1991).en_US
dc.identifier.urihttp://hdl.handle.net/1850/9641
dc.descriptionCopyright 1991 The American Institute of Physics. All Rights Reserved. This article can also be found on the publishers website: http://ojps.aip.org/japo/en_US
dc.description.abstractExperimental studies of the reflection, transmission, and absorption of high-power microwave pulses from a plasma-covered plane conducting boundary are presented. Under optimum conditions, backscattered rf power is attenuated by more than 30 dB over values measured in the absence of the plasma. Measurements of the radial and axial plasma density profiles and the neutral gas pressure near the plane conductor indicate that collisional absorption processes are not the primary source of the observed attenuation in the backscattered microwave signal, and that the plasma density exceeds the critical density over much of the volume nearest the conductor. The effects of a tenfold reduction in the microwave power density on the reflection and absorption characteristics of the system are also reported.en_US
dc.language.isoen_USen_US
dc.publisherThe American Institute of Physicsen_US
dc.relation.ispartofseriesVol. 69en_US
dc.relation.ispartofseriesIssue 9en_US
dc.titleExperimental studies of high-power microwave reflection, transmission, and absorption from a plasma-covered plane conducting boundaryen_US
dc.typeArticleen_US


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