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dc.contributor.authorWagner, Andrew
dc.contributor.authorWhiting, P.
dc.contributor.authorMariotti, Davide
dc.date.accessioned2009-06-25T19:52:42Z
dc.date.available2009-06-25T19:52:42Z
dc.date.issued2008-05-03
dc.identifier.citation8th Annual IEEE Student Design Contesten_US
dc.identifier.urihttp://hdl.handle.net/1850/9992
dc.description8th Annual IEEE Student Design Contest, 3 May 2008, Rochester (NY), USA. Held by the Rochester Institute of Technology (RIT) Institute of Electrical and Electronics Engineers (IEEE) student chapter.en_US
dc.language.isoen_USen_US
dc.publisherRochester Institute of Technology chapter of the Institute of Electrical and Electronics Engineers (IEEE)en_US
dc.titleDevelopment of a linear source, atmospheric-pressure, non-thermal RF glow discharge plasma for surface treatment, etchin, and thin film depositionen_US
dc.typeProceedingsen_US


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