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dc.contributor.authorDillon, Anneen_US
dc.contributor.authorParilla, Philipen_US
dc.contributor.authorAlleman, Jeffreyen_US
dc.contributor.authorGennett, Thomasen_US
dc.contributor.authorJones, K.en_US
dc.contributor.authorHeben, Michaelen_US
dc.date.accessioned2006-07-19T19:43:34Zen_US
dc.date.available2006-07-19T19:43:34Zen_US
dc.date.issued2005-01-11en_US
dc.identifier.citationChemical Physics Letters 401N4-6 (2005) 522-528en_US
dc.identifier.issn0009-2614en_US
dc.identifier.urihttp://hdl.handle.net/1850/2180en_US
dc.description.abstractThe Raman D-band feature (∼1350 cm[-][1]) is examined with 2.54 eV excitation for pure bulk carbon single-wall nanotube samples before and after treatments that increase defect densities. Upon employing mass-transport-limited oxidation to introduce defects, the D-band intensity increases approximately linearly with reaction time. A relatively constant ratio of the D-band intensity and the major tangential G-band intensity (D/G) is observed for the purified samples examined at 2.54 and 1.96 eV suggesting a characteristic number of defects is introduced for given synthesis and purification processes. The DIG ratio is ∼1/90 and 1/40 for excitation at 2.54 and 1.96 eV, respectively.en_US
dc.format.extent37365 bytesen_US
dc.format.mimetypeapplication/pdfen_US
dc.language.isoen_USen_US
dc.publisherElsevier: Chemical Physics Lettersen_US
dc.subjectDefectsen_US
dc.subjectRaman D-banden_US
dc.subjectSingle-wall nanotubesen_US
dc.titleSystematic inclusion of defects in pure carbon single-wall nanotubes and their effect on the Raman D-banden_US
dc.typeAbstracten_US
dc.identifier.urlhttp://dx.doi.org/10.1016/j.cplett.2004.11.104


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